Material Science
Chemical Vapor Deposition
100%
Film
58%
Polymer Films
57%
Copolymer
52%
Thin Films
48%
Vapor Phase Deposition
42%
Microplastics
31%
Poly(Dimethylsiloxane)
27%
Bond Strength (Materials)
27%
Polyethylene Terephthalate
22%
Contact Angle
20%
Superhydrophobic
20%
Solution
20%
Polyester
17%
Asphaltenes
17%
Fluorescence Microscopy
16%
Density
15%
Electronic Circuit
14%
Mechanical Strength
13%
Polystyrene
13%
Morphology
13%
Surface Energy
12%
Analytical Method
11%
Device Integration
10%
Wettability
10%
Potable Water
10%
Inorganic Polymer
10%
Polycarbonate
10%
Fluoropolymer
10%
Plastic Film
10%
Carbon Nanotube
10%
Photocatalysis
10%
Poly Methyl Methacrylate
10%
Composite Films
10%
Metal Film
10%
Deep Eutectic Solvent
10%
Crude Oil
10%
Device Fabrication
10%
Hydrogel
10%
Fluorescence Spectroscopy
10%
Surface Cleaning
10%
Diamond
10%
Crystal Growth
10%
Carbon Dioxide
10%
Surface-Enhanced Raman Spectroscopy
10%
Surface Tension
8%
Chemical Property
7%
Ultrahydrophobic Coating
6%
Silicon Wafer
6%
Oil-Water Emulsion
5%
Engineering
Vapor Deposition
66%
Chemical Vapor Deposition
64%
Thin Films
40%
Microfluidic Device
38%
Mixers (Machinery)
34%
Phase Separation
31%
Flow Rate
30%
Polydimethylsiloxane
23%
Deposition Process
23%
One Step
22%
Total Internal Reflection
20%
Oil Sand
20%
Hydrophilicity
20%
Hydrophobic
19%
Microfluidic Channel
13%
Liquid Phase
12%
Asphaltenes
11%
Fluorescence Imaging
11%
Aqueous Solution
11%
Heavy Oil
10%
Raman Spectrum
10%
Model Compound
10%
Chemical Engineering
10%
Focal Length
10%
Carbon Nanotube
10%
Characteristic Peak
10%
Passivation
10%
Pretreatment
10%
Early Stage
10%
Fiber Mat
10%
Microfibres
10%
Electrospun Fiber
10%
Frequency Domain
10%
Energy Surface
10%
Deep Learning
10%
Situ Observation
10%
Machine Learning Algorithm
10%
Strong Adhesion
10%
Barrier Performance
10%
Hydrogel
10%
Low-Temperature
10%
Channel Geometry
10%
Fluid Viscosity
10%
Single Stream
10%
Static Method
10%
Theoretical Value
10%
Rectangular Channel
10%
Surface Cleaning
10%
Hydrophobic Interaction
10%
Continuous Process
10%