90 MHz nanomechanical structures fabricated by stencil deposition and dry etching

G. M. Kim, M. A.F. Van Den Boogaart, S. Kawai, H. Kawakatsu, J. Brugger

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

We present a simple method for fabricating fast resonating (90 MHz) nanomechanical elements based on the local deposition through a miniaturized shadow mask (nanostencil), followed by dry etching to release the structure from the substrate. The measured resonance frequency of a fabricated nanomechanical structure shows high resonance frequency up to 90 MHz. This resistless and dry process provides a flexible, rapid and stiction-free approach for the fabrication of ultra-fast resonating elements in various materials.

Original languageEnglish
Title of host publicationTRANSDUCERS 2003 - 12th International Conference on Solid-State Sensors, Actuators and Microsystems, Digest of Technical Papers
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages883-886
Number of pages4
ISBN (Electronic)0780377311, 9780780377318
DOIs
StatePublished - 2003
Event12th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2003 - Digest of Technical Papers - Boston, United States
Duration: 8 Jun 200312 Jun 2003

Publication series

NameTRANSDUCERS 2003 - 12th International Conference on Solid-State Sensors, Actuators and Microsystems, Digest of Technical Papers
Volume1

Conference

Conference12th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2003 - Digest of Technical Papers
Country/TerritoryUnited States
CityBoston
Period8/06/0312/06/03

Keywords

  • Atomic force microscopy
  • Dry etching
  • Fabrication
  • Lithography
  • Nanoelectromechanical systems
  • Nanoscale devices
  • Nanostructures
  • Resonance
  • Resonant frequency
  • Silicon compounds

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