Abstract
This paper proposes a new FeRAM design style based on grounded-plate FMOS-gate (GFPG) cell structure. A GPPG cell consists of a PMOS access transistor and a ferroelectric capacitor. Its plate is grounded. The proposed scheme employs three novel operating methods: 1) VDD precharged bitline, 2) negative-voltage wordline technique and 3) negative-pulse restore. Because this configuration doesn't need the onpitch plate control circuitry, it is effective in realizing cost-effective chip sizes. Implementation, of a 2.5-V, 2-Mb FeRAM prototype design in a 0.5-μm technology shows a cell array efficiency of 57%, an access time of 85 ns and an active current of 12mA, respectively.
Original language | English |
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Pages (from-to) | 1686-1693 |
Number of pages | 8 |
Journal | IEICE Transactions on Electronics |
Volume | E87-C |
Issue number | 10 |
State | Published - Oct 2004 |
Keywords
- FeRAM
- Ferroelectrics
- Memory
- Nonvolatile