A 206-294GHz 3-stage amplifier in 35nm InP mHEMT, using a thin-film microstrip environment

Zach Griffith, Wonill Ha, Peter Chen, Dae Hyun Kim, Bobby Brar

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

9 Scopus citations

Abstract

We present a compact, 3-stage millimeter-wave monolithic integrated circuit (MMIC) amplifier with an operating frequency of 206-294 GHz, formed by commonsource configured 35 nm Lg InP mHEMTs and a multilayer thin-film microstrip (TFM) wiring environment. The amplifier S21 mid-band gain is 11-16 dB, 3 dB bandwidth at 294 GHz, and 82.5 mW P DC. This is the first reported InP HEMT MMIC operating in G-, H-band employing thinfilm microstrip. Because the TFM ground-plane shields the signal interconnects from the substrate, well behaved device (0.1-67, 140-200,210-310 GHz) and amplifier (206-320 GHz) measurements are presented from an unthinned, 25 mil substrate. The total size of this 3-stage amplifier is only 0.77×O.40 mm2.

Original languageEnglish
Title of host publication2010 IEEE MTT-S International Microwave Symposium, MTT 2010
Pages57-60
Number of pages4
DOIs
StatePublished - 2010
Event2010 IEEE MTT-S International Microwave Symposium, MTT 2010 - Anaheim, CA, United States
Duration: 23 May 201028 May 2010

Publication series

NameIEEE MTT-S International Microwave Symposium Digest
ISSN (Print)0149-645X

Conference

Conference2010 IEEE MTT-S International Microwave Symposium, MTT 2010
Country/TerritoryUnited States
CityAnaheim, CA
Period23/05/1028/05/10

Keywords

  • E-mode transistor
  • InP metamorphic high electron mobility transistor (InP mHEMT)
  • Low-loss dielectric layer
  • Millimeter Wave
  • MMIC
  • Multiple interconnect layers
  • Thin-film microstrip

Fingerprint

Dive into the research topics of 'A 206-294GHz 3-stage amplifier in 35nm InP mHEMT, using a thin-film microstrip environment'. Together they form a unique fingerprint.

Cite this