A durable VO2 transition layer and defect inactivation in BiVO4via spontaneous valence-charge control

Dong Su Kim, Kun Woong Lee, Ji Hoon Choi, Hak Hyeon Lee, Hee Won Suh, Ho Seong Lee, Hyung Koun Cho

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

The performance of bismuth vanadate (BiVO4) photoanodes is limited by surface defects and photo-corrosion instability. This paper proposes a revolutionary protection layer that overcomes these problems. Considering the role of V5+ ion dissolution in photo-corrosion, we propose a surface photoelectrochemical oxidation approach, artificially altering photo-corrosion to advanced photo-oxidation by strategically adding V5+ and H2O2 to the electrolyte. The surface phase transition thus induced creates an unprecedented vanadium oxide (VO2) photoelectrochemical protection layer that is robust, conductive, and ultrathin, while exhibiting atomic controllability. Charge-kinetic characterization of the BiVO4/VO2 photoanodes revealed faster transport of interfacial charges (86%) and transfer of photogenerated carriers through the VO2 protection layer (95%); this approach affords near-ideal performance and contributes toward high stability and extreme durability. The BiVO4/VO2/CoFeOx photoanodes displayed a high photocurrent density of 6.2 mA cm−2 and an onset potential of 0.25 VRHE, with an applied bias photon-to-current efficiency of 2.4% at 0.62

Original languageEnglish
Pages (from-to)21300-21314
Number of pages15
JournalJournal of Materials Chemistry A
Volume10
Issue number40
DOIs
StatePublished - 24 Aug 2022

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