A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications

Plasmonic filters are advantageous for fabricating the state-of-the-art color filters without any coloring resist materials. In this paper, a filter design is introduced for the optical structure of plasmonic filters and their fabrication, which allows highly reproducible nanopatterning on large areas. The optical structure of these plasmonic filters consists of 2-D hole arrays in a thin metal film. Although laser interference lithography technology allows a high accuracy of regularity across the whole fabrication region, the exposure light is easily disturbed by vibrations or dust in the air. The suggested process enhances the accuracy and reproducibility of nanopatterns, which also exhibit a high performance. This paper will help realize plasmonic filters in conjunction with industry.