@inproceedings{da026756de5f49d3b7e3f90a5e2b9cc8,
title = "A Method for Diagnosing the Process Chamber Prior to Plasma Processes",
abstract = "This paper presents a method to diagnose a process chamber prior to the plasma process. Although a variety of studies on plasma diagnostics have been implemented, they detect the states only during the plasma processes. In addition to the process states, it is essential to diagnose a process chamber itself before the process for proper preparation. For example, abnormal states such as hardware assembly issues and wafer shift should be monitored. The proposed method is based on the broadband S11 that is measured through a viewport of the process chamber. Depending on the dimensions of the process chamber, resonance behaviors are observed at specific frequencies. For the multiple resonances, asymmetrical multiple resonance probes (MRP) were investigated through EM simulation. In addition, it was verified that the process chamber can be diagnosed with a similarity algorithm, comparing S11 of the abnormal states with that of the normal state in terms of magnitude and phase.",
keywords = "3-D electromagnetic simulations, chamber diagnostics, multipole resonance probe, semiconductor manufacturing process",
author = "Kim, {Seong Jin} and Heechul Jung and Lee, {Hyo Won} and Seongju Lim and Lee, {Ji Hoon} and Yu, {Jong Won} and Jaehyun Kim and Lee, {Sang Won}",
note = "Publisher Copyright: {\textcopyright} 2023 IEEE.; 31st Asia-Pacific Microwave Conference, APMC 2023 ; Conference date: 05-12-2023 Through 08-12-2023",
year = "2023",
doi = "10.1109/APMC57107.2023.10439894",
language = "English",
series = "Asia-Pacific Microwave Conference Proceedings, APMC",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "366--368",
booktitle = "2023 Asia-Pacific Microwave Conference, APMC 2023",
address = "United States",
}