Abstract
We have fabricated an enhancement-mode n-channel Schottky-barrier-MOSFET(SB-MOSFET) for the first time on a high mobility p-type GaN film grown on silicon substrate. The metal contacts were formed by depositing Al for source/drain contact and Au for gate contact, respectively. Fabricated SB-MOSFET exhibited a threshold voltage of 1.65 V, and a maximum transconductance (gm) of 1.6 mS/mm at VDS = 5 V, which belongs to one of the highest value in GaN MOSFET. The maximum drain current was higher than 3 mA/mm and the off-state drain current was as low as 3 nA/mm.
Original language | English |
---|---|
Pages (from-to) | 81-83 |
Number of pages | 3 |
Journal | IEEE Electron Device Letters |
Volume | 27 |
Issue number | 2 |
DOIs | |
State | Published - Feb 2006 |
Keywords
- GaN
- MOSFET
- Schottky barrier (SB)