A normally off GaN n-MOSFET with Schottky-barrier source and drain on a Si-auto-doped p-GaN/Si

Heon Bok Lee, Hyun Ick Cho, Hyun Su An, Young Ho Bae, Myoung Bok Lee, Jung Hee Lee, Sung Ho Hahm

Research output: Contribution to journalArticlepeer-review

56 Scopus citations

Abstract

We have fabricated an enhancement-mode n-channel Schottky-barrier-MOSFET(SB-MOSFET) for the first time on a high mobility p-type GaN film grown on silicon substrate. The metal contacts were formed by depositing Al for source/drain contact and Au for gate contact, respectively. Fabricated SB-MOSFET exhibited a threshold voltage of 1.65 V, and a maximum transconductance (gm) of 1.6 mS/mm at VDS = 5 V, which belongs to one of the highest value in GaN MOSFET. The maximum drain current was higher than 3 mA/mm and the off-state drain current was as low as 3 nA/mm.

Original languageEnglish
Pages (from-to)81-83
Number of pages3
JournalIEEE Electron Device Letters
Volume27
Issue number2
DOIs
StatePublished - Feb 2006

Keywords

  • GaN
  • MOSFET
  • Schottky barrier (SB)

Fingerprint

Dive into the research topics of 'A normally off GaN n-MOSFET with Schottky-barrier source and drain on a Si-auto-doped p-GaN/Si'. Together they form a unique fingerprint.

Cite this