A study on MgO characteristics of AC plasma display panel fabricated by vacuum sealing method

Choon Sang Park; Heung Sik Tae; Young Kuk Kwon; Eun Gi Heo

doi:10.1080/15421400802619883

A study on MgO characteristics of AC plasma display panel fabricated by vacuum sealing method

Choon Sang Park, Heung Sik Tae, Young Kuk Kwon, Eun Gi Heo

School of Electronics Engineering

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

In this paper, the vacuum sealing method to enhance a base vacuum level was adopted, and the resultant changes in the MgO characteristics, such as firing voltage, MgO sputtering rate, MgO hardness, and photoluminescence, were examined in comparison with those in the conventional sealing method in the 42-in. AC-PDP with a high Xe (15%) content. The 42-in. panel fabricated by the vacuum sealing method caused the changes in the MgO characteristics, such as firing voltage, MgO sputtering rate, MgO hardness, and photoluminescence, which are caused by an increase in the oxygen vacancy of the MgO layer.

Original language	English
Pages (from-to)	224/[546]-233/[555]
Journal	Molecular Crystals and Liquid Crystals
Volume	499
DOIs	https://doi.org/10.1080/15421400802619883
State	Published - Feb 2009

Keywords

42-in. AC-PDP module
Firing voltage
Focused ion beam
MgO hardness
MgO sputtering rate
Nanoindentor
Oxygen vacancy
Photoluminescence
Vacuum sealing method
Vt closed curve

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10.1080/15421400802619883

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@article{77ce5889a1f84392beb0260ce32960d3,

title = "A study on MgO characteristics of AC plasma display panel fabricated by vacuum sealing method",

abstract = "In this paper, the vacuum sealing method to enhance a base vacuum level was adopted, and the resultant changes in the MgO characteristics, such as firing voltage, MgO sputtering rate, MgO hardness, and photoluminescence, were examined in comparison with those in the conventional sealing method in the 42-in. AC-PDP with a high Xe (15%) content. The 42-in. panel fabricated by the vacuum sealing method caused the changes in the MgO characteristics, such as firing voltage, MgO sputtering rate, MgO hardness, and photoluminescence, which are caused by an increase in the oxygen vacancy of the MgO layer.",

keywords = "42-in. AC-PDP module, Firing voltage, Focused ion beam, MgO hardness, MgO sputtering rate, Nanoindentor, Oxygen vacancy, Photoluminescence, Vacuum sealing method, Vt closed curve",

author = "Park, {Choon Sang} and Tae, {Heung Sik} and Kwon, {Young Kuk} and Heo, {Eun Gi}",

year = "2009",

month = feb,

doi = "10.1080/15421400802619883",

language = "English",

volume = "499",

pages = "224/[546]--233/[555]",

journal = "Molecular Crystals and Liquid Crystals",

issn = "1542-1406",

publisher = "Taylor and Francis Ltd.",

}

TY - JOUR

T1 - A study on MgO characteristics of AC plasma display panel fabricated by vacuum sealing method

AU - Park, Choon Sang

AU - Tae, Heung Sik

AU - Kwon, Young Kuk

AU - Heo, Eun Gi

PY - 2009/2

Y1 - 2009/2

N2 - In this paper, the vacuum sealing method to enhance a base vacuum level was adopted, and the resultant changes in the MgO characteristics, such as firing voltage, MgO sputtering rate, MgO hardness, and photoluminescence, were examined in comparison with those in the conventional sealing method in the 42-in. AC-PDP with a high Xe (15%) content. The 42-in. panel fabricated by the vacuum sealing method caused the changes in the MgO characteristics, such as firing voltage, MgO sputtering rate, MgO hardness, and photoluminescence, which are caused by an increase in the oxygen vacancy of the MgO layer.

AB - In this paper, the vacuum sealing method to enhance a base vacuum level was adopted, and the resultant changes in the MgO characteristics, such as firing voltage, MgO sputtering rate, MgO hardness, and photoluminescence, were examined in comparison with those in the conventional sealing method in the 42-in. AC-PDP with a high Xe (15%) content. The 42-in. panel fabricated by the vacuum sealing method caused the changes in the MgO characteristics, such as firing voltage, MgO sputtering rate, MgO hardness, and photoluminescence, which are caused by an increase in the oxygen vacancy of the MgO layer.

KW - 42-in. AC-PDP module

KW - Firing voltage

KW - Focused ion beam

KW - MgO hardness

KW - MgO sputtering rate

KW - Nanoindentor

KW - Oxygen vacancy

KW - Photoluminescence

KW - Vacuum sealing method

KW - Vt closed curve

UR - http://www.scopus.com/inward/record.url?scp=61449195763&partnerID=8YFLogxK

U2 - 10.1080/15421400802619883

DO - 10.1080/15421400802619883

M3 - Article

AN - SCOPUS:61449195763

SN - 1542-1406

VL - 499

SP - 224/[546]-233/[555]

JO - Molecular Crystals and Liquid Crystals

JF - Molecular Crystals and Liquid Crystals

ER -

A study on MgO characteristics of AC plasma display panel fabricated by vacuum sealing method

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