An Optimized Standard Cell Design Methodology Targeting Low Parasitics and Small Area for Complementary FETs (CFETs)

Eunbin Park, Taigon Song

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Scopus citations

Abstract

The Complementary FET (CFET) is known to be a potential device to continue the feature size scaling. However, studies forecast that increased parasitic RC neutralizes the area reduction advantage that CFETs can provide. In this paper, (1) we report that RC increase by CFETs is not that significant (only +4.25% compared to 5 track FinFET INV), and (2) propose a design methodology that optimizes the parasitics of CFET standard cells to make this happen. Our methodology shows improvements in parasitics by up to 8.15% for capacitance and 32.73% for resistance when comparing the two types of CFET structures.

Original languageEnglish
Title of host publicationProceedings - International SoC Design Conference 2021, ISOCC 2021
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages395-396
Number of pages2
ISBN (Electronic)9781665401746
DOIs
StatePublished - 2021
Event18th International System-on-Chip Design Conference, ISOCC 2021 - Jeju Island, Korea, Republic of
Duration: 6 Oct 20219 Oct 2021

Publication series

NameProceedings - International SoC Design Conference 2021, ISOCC 2021

Conference

Conference18th International System-on-Chip Design Conference, ISOCC 2021
Country/TerritoryKorea, Republic of
CityJeju Island
Period6/10/219/10/21

Keywords

  • beyond N3
  • CFET
  • parasitics
  • standard cells

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