Abstract
The superconducting characteristics of Nb thin films deposited by using a DC magnetron sputtering system are investigated as a function of the sputtering temperature. The crystallinities of Nb and NbO are analyzed using an X-ray diffractometer (XRD), and the surface characteristics are analyzed using a field-emission scanning electron microscope (FE-SEM) and an atomic force microscope (AFM). The superconducting characteristics of the fabricated Nb thin films are confirmed using measurements of the resistance as a function of the temperature. The Nb thin film grown at a sputtering temperature of 240◦C exhibits the highest crystallinity of Nb and the lowest crystallinity of NbO. The superconducting transition temperature (Tc) of the optimized film is 8.34 K, which is close to Tc of bulk Nb, 9.25 K. Therefore, we confirm that NbO crystallinity caused by oxygen is the critical factor that inhibits the superconducting characteristics of the Nb thin films.
Original language | English |
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Pages (from-to) | 284-289 |
Number of pages | 6 |
Journal | New Physics: Sae Mulli |
Volume | 68 |
Issue number | 3 |
DOIs | |
State | Published - Mar 2018 |
Keywords
- Deposition by sputtering
- Superconducting films
- Superconducting properties