Analytical thermal noise model suitable for circuit design using short-channel MOSFETs

Jongwook Jeon, Seyoung Kim, In Man Kang, Kwangsuk Han, Kwyro Lee, Hyungcheol Shin

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

3 Scopus citations

Abstract

This paper proposes a new analytical noise model for short-channel MOSFETs which covers both the linear and the saturation regions. Both the channel thermal noise model and the gate-induced model are presented. The analytical equations for the noise parameters are also derived. Modeling results show an excellent agreement with the measured noise parameter data.

Original languageEnglish
Title of host publication2005 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium - Digest of Papers
EditorsA. Jerng
Pages637-640
Number of pages4
DOIs
StatePublished - 2005
Event2005 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium - Digest of Papers - Long Beach, CA, United States
Duration: 12 Jun 200514 Jun 2005

Publication series

NameDigest of Papers - IEEE Radio Frequency Integrated Circuits Symposium
ISSN (Print)1529-2517

Conference

Conference2005 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium - Digest of Papers
Country/TerritoryUnited States
CityLong Beach, CA
Period12/06/0514/06/05

Keywords

  • Drain thermal noise
  • Induced gate noise
  • Noise parameters
  • RF CMOS
  • Velocity saturation effect

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