Annealing temperature dependence of contact resistance and stablity for Ti/Al/Pt/Au ohmic contacts to bulk n-Zno

K. Ip; K. H. Baik; Y. W. Heo; D. P. Norton; S. J. Pearton; J. R. LaRoche; B. Luo; F. Ren; J. M. Zavada

doi:10.1116/1.1621651

Annealing temperature dependence of contact resistance and stablity for Ti/Al/Pt/Au ohmic contacts to bulk n-Zno

K. Ip, K. H. Baik, Y. W. Heo, D. P. Norton, S. J. Pearton, J. R. LaRoche, B. Luo, F. Ren, J. M. Zavada

Research output: Contribution to journal › Article › peer-review

25 Scopus citations

Original language	English
Pages (from-to)	2378-2381
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	21
Issue number	6
DOIs	https://doi.org/10.1116/1.1621651
State	Published - 2003

Access to Document

10.1116/1.1621651

Cite this

Ip, K., Baik, K. H., Heo, Y. W., Norton, D. P., Pearton, S. J., LaRoche, J. R., Luo, B., Ren, F., & Zavada, J. M. (2003). Annealing temperature dependence of contact resistance and stablity for Ti/Al/Pt/Au ohmic contacts to bulk n-Zno. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 21(6), 2378-2381. https://doi.org/10.1116/1.1621651

@article{f5b56e709806472685e598fff3abbc49,

title = "Annealing temperature dependence of contact resistance and stablity for Ti/Al/Pt/Au ohmic contacts to bulk n-Zno",

author = "K. Ip and Baik, {K. H.} and Heo, {Y. W.} and Norton, {D. P.} and Pearton, {S. J.} and LaRoche, {J. R.} and B. Luo and F. Ren and Zavada, {J. M.}",

year = "2003",

doi = "10.1116/1.1621651",

language = "English",

volume = "21",

pages = "2378--2381",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "6",

}

TY - JOUR

T1 - Annealing temperature dependence of contact resistance and stablity for Ti/Al/Pt/Au ohmic contacts to bulk n-Zno

AU - Ip, K.

AU - Baik, K. H.

AU - Heo, Y. W.

AU - Norton, D. P.

AU - Pearton, S. J.

AU - LaRoche, J. R.

AU - Luo, B.

AU - Ren, F.

AU - Zavada, J. M.

PY - 2003

Y1 - 2003

UR - http://www.scopus.com/inward/record.url?scp=0942267202&partnerID=8YFLogxK

U2 - 10.1116/1.1621651

DO - 10.1116/1.1621651

M3 - Article

AN - SCOPUS:0942267202

SN - 1071-1023

VL - 21

SP - 2378

EP - 2381

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

ER -

Annealing temperature dependence of contact resistance and stablity for Ti/Al/Pt/Au ohmic contacts to bulk n-Zno

Access to Document

Other files and links

Cite this