Abstract
The atomic force microscopy (AFM)-based nano-lithographic technique is currently used to directly machine material surfaces and fabricate nano-components for MEMS device. In the current study, three-dimensional molecular dynamic (MD) simulations with potentials based on the Morse function were performed to evaluate the effect of crystallographic factors and process variables on the nano-deformation characteristics of the nano-lithography process of monocrystalline copper. Moreover, the effects of process variables (the tool shape, cutting speed and undeformed chip thickness) on the nano-structural pattern are investigated. The simulation results revealed that the crystal orientation and ploughing direction had a significant influence on varying the forces (cutting force, thrust force, and width-direction force) as well as the nature of the nano-deformation ahead of the tool and surface quality of the machined material.
Original language | English |
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Pages (from-to) | 1847-1854 |
Number of pages | 8 |
Journal | Journal of Materials Processing Technology |
Volume | 155-156 |
Issue number | 1-3 |
DOIs | |
State | Published - 30 Nov 2004 |
Keywords
- AFM
- MEMS
- Molecular dynamics simulation
- Nano-lithography