Atomic force microscopy-based nano-lithography for nano-patterning: A molecular dynamic study

Y. S. Kim, K. H. Na, S. O. Choi, S. H. Yang

Research output: Contribution to journalArticlepeer-review

33 Scopus citations

Abstract

The atomic force microscopy (AFM)-based nano-lithographic technique is currently used to directly machine material surfaces and fabricate nano-components for MEMS device. In the current study, three-dimensional molecular dynamic (MD) simulations with potentials based on the Morse function were performed to evaluate the effect of crystallographic factors and process variables on the nano-deformation characteristics of the nano-lithography process of monocrystalline copper. Moreover, the effects of process variables (the tool shape, cutting speed and undeformed chip thickness) on the nano-structural pattern are investigated. The simulation results revealed that the crystal orientation and ploughing direction had a significant influence on varying the forces (cutting force, thrust force, and width-direction force) as well as the nature of the nano-deformation ahead of the tool and surface quality of the machined material.

Original languageEnglish
Pages (from-to)1847-1854
Number of pages8
JournalJournal of Materials Processing Technology
Volume155-156
Issue number1-3
DOIs
StatePublished - 30 Nov 2004

Keywords

  • AFM
  • MEMS
  • Molecular dynamics simulation
  • Nano-lithography

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