Atomic force microscopy-based nano-lithography for nano-patterning: A molecular dynamic study

Y. S. Kim; K. H. Na; S. O. Choi; S. H. Yang

doi:10.1016/j.jmatprotec.2004.04.377

Atomic force microscopy-based nano-lithography for nano-patterning: A molecular dynamic study

Y. S. Kim
, K. H. Na
, S. O. Choi
, S. H. Yang

School of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

33 Scopus citations

Abstract

The atomic force microscopy (AFM)-based nano-lithographic technique is currently used to directly machine material surfaces and fabricate nano-components for MEMS device. In the current study, three-dimensional molecular dynamic (MD) simulations with potentials based on the Morse function were performed to evaluate the effect of crystallographic factors and process variables on the nano-deformation characteristics of the nano-lithography process of monocrystalline copper. Moreover, the effects of process variables (the tool shape, cutting speed and undeformed chip thickness) on the nano-structural pattern are investigated. The simulation results revealed that the crystal orientation and ploughing direction had a significant influence on varying the forces (cutting force, thrust force, and width-direction force) as well as the nature of the nano-deformation ahead of the tool and surface quality of the machined material.

Original language	English
Pages (from-to)	1847-1854
Number of pages	8
Journal	Journal of Materials Processing Technology
Volume	155-156
Issue number	1-3
DOIs	https://doi.org/10.1016/j.jmatprotec.2004.04.377
State	Published - 30 Nov 2004

Keywords

AFM
MEMS
Molecular dynamics simulation
Nano-lithography

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10.1016/j.jmatprotec.2004.04.377

Cite this

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title = "Atomic force microscopy-based nano-lithography for nano-patterning: A molecular dynamic study",

abstract = "The atomic force microscopy (AFM)-based nano-lithographic technique is currently used to directly machine material surfaces and fabricate nano-components for MEMS device. In the current study, three-dimensional molecular dynamic (MD) simulations with potentials based on the Morse function were performed to evaluate the effect of crystallographic factors and process variables on the nano-deformation characteristics of the nano-lithography process of monocrystalline copper. Moreover, the effects of process variables (the tool shape, cutting speed and undeformed chip thickness) on the nano-structural pattern are investigated. The simulation results revealed that the crystal orientation and ploughing direction had a significant influence on varying the forces (cutting force, thrust force, and width-direction force) as well as the nature of the nano-deformation ahead of the tool and surface quality of the machined material.",

keywords = "AFM, MEMS, Molecular dynamics simulation, Nano-lithography",

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doi = "10.1016/j.jmatprotec.2004.04.377",

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T1 - Atomic force microscopy-based nano-lithography for nano-patterning

T2 - A molecular dynamic study

AU - Kim, Y. S.

AU - Na, K. H.

AU - Choi, S. O.

AU - Yang, S. H.

PY - 2004/11/30

Y1 - 2004/11/30

N2 - The atomic force microscopy (AFM)-based nano-lithographic technique is currently used to directly machine material surfaces and fabricate nano-components for MEMS device. In the current study, three-dimensional molecular dynamic (MD) simulations with potentials based on the Morse function were performed to evaluate the effect of crystallographic factors and process variables on the nano-deformation characteristics of the nano-lithography process of monocrystalline copper. Moreover, the effects of process variables (the tool shape, cutting speed and undeformed chip thickness) on the nano-structural pattern are investigated. The simulation results revealed that the crystal orientation and ploughing direction had a significant influence on varying the forces (cutting force, thrust force, and width-direction force) as well as the nature of the nano-deformation ahead of the tool and surface quality of the machined material.

AB - The atomic force microscopy (AFM)-based nano-lithographic technique is currently used to directly machine material surfaces and fabricate nano-components for MEMS device. In the current study, three-dimensional molecular dynamic (MD) simulations with potentials based on the Morse function were performed to evaluate the effect of crystallographic factors and process variables on the nano-deformation characteristics of the nano-lithography process of monocrystalline copper. Moreover, the effects of process variables (the tool shape, cutting speed and undeformed chip thickness) on the nano-structural pattern are investigated. The simulation results revealed that the crystal orientation and ploughing direction had a significant influence on varying the forces (cutting force, thrust force, and width-direction force) as well as the nature of the nano-deformation ahead of the tool and surface quality of the machined material.

KW - AFM

KW - MEMS

KW - Molecular dynamics simulation

KW - Nano-lithography

UR - https://www.scopus.com/pages/publications/10044250977

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DO - 10.1016/j.jmatprotec.2004.04.377

M3 - Article

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VL - 155-156

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JO - Journal of Materials Processing Technology

JF - Journal of Materials Processing Technology

IS - 1-3

ER -

Atomic force microscopy-based nano-lithography for nano-patterning: A molecular dynamic study

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Keywords

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