Characterization of nano-structured TiN thin films prepared by R.F. magnetron sputtering

Taek Soo Kim; Sang Shik Park; Byong Taek Lee

doi:10.1016/j.matlet.2005.07.047

Characterization of nano-structured TiN thin films prepared by R.F. magnetron sputtering

Taek Soo Kim, Sang Shik Park, Byong Taek Lee

Research output: Contribution to journal › Article › peer-review

38 Scopus citations

Abstract

TiN thin films were deposited on Si substrate using an R.F. sputter as a function of Ar / N₂ ratio of 20 : 30, 10 :3 0 and 0 : 30. The average thickness of thin film was 0.7 μm, while the size of TiN nano-particles dispersed in the matrix was 5∼10 nm in diameter. The microstructure became fine as the flow rate of N₂ to Ar gas increased. The hardness and elastic modulus measured by a nanoindentation method were also enhanced. It discussed the fracture pattern took placed at the TiN layer during the indentation.

Original language	English
Pages (from-to)	3929-3932
Number of pages	4
Journal	Materials Letters
Volume	59
Issue number	29-30
DOIs	https://doi.org/10.1016/j.matlet.2005.07.047
State	Published - Dec 2005

Keywords

Nanoindentation
Nanostructures
R.F. sputtering
TiN thin film

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10.1016/j.matlet.2005.07.047

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title = "Characterization of nano-structured TiN thin films prepared by R.F. magnetron sputtering",

abstract = "TiN thin films were deposited on Si substrate using an R.F. sputter as a function of Ar / N2 ratio of 20 : 30, 10 :3 0 and 0 : 30. The average thickness of thin film was 0.7 μm, while the size of TiN nano-particles dispersed in the matrix was 5∼10 nm in diameter. The microstructure became fine as the flow rate of N2 to Ar gas increased. The hardness and elastic modulus measured by a nanoindentation method were also enhanced. It discussed the fracture pattern took placed at the TiN layer during the indentation.",

keywords = "Nanoindentation, Nanostructures, R.F. sputtering, TiN thin film",

author = "Kim, {Taek Soo} and Park, {Sang Shik} and Lee, {Byong Taek}",

year = "2005",

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doi = "10.1016/j.matlet.2005.07.047",

language = "English",

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journal = "Materials Letters",

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T1 - Characterization of nano-structured TiN thin films prepared by R.F. magnetron sputtering

AU - Kim, Taek Soo

AU - Park, Sang Shik

AU - Lee, Byong Taek

PY - 2005/12

Y1 - 2005/12

N2 - TiN thin films were deposited on Si substrate using an R.F. sputter as a function of Ar / N2 ratio of 20 : 30, 10 :3 0 and 0 : 30. The average thickness of thin film was 0.7 μm, while the size of TiN nano-particles dispersed in the matrix was 5∼10 nm in diameter. The microstructure became fine as the flow rate of N2 to Ar gas increased. The hardness and elastic modulus measured by a nanoindentation method were also enhanced. It discussed the fracture pattern took placed at the TiN layer during the indentation.

AB - TiN thin films were deposited on Si substrate using an R.F. sputter as a function of Ar / N2 ratio of 20 : 30, 10 :3 0 and 0 : 30. The average thickness of thin film was 0.7 μm, while the size of TiN nano-particles dispersed in the matrix was 5∼10 nm in diameter. The microstructure became fine as the flow rate of N2 to Ar gas increased. The hardness and elastic modulus measured by a nanoindentation method were also enhanced. It discussed the fracture pattern took placed at the TiN layer during the indentation.

KW - Nanoindentation

KW - Nanostructures

KW - R.F. sputtering

KW - TiN thin film

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DO - 10.1016/j.matlet.2005.07.047

M3 - Article

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SN - 0167-577X

VL - 59

SP - 3929

EP - 3932

JO - Materials Letters

JF - Materials Letters

IS - 29-30

ER -

Characterization of nano-structured TiN thin films prepared by R.F. magnetron sputtering

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Keywords

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