Abstract
The properties of ZnO films for devices are reviewed, focusing on chemical doping for charge and FET device formation. This includes the behavior of phosphorus as a deep acceptor and polycrystalline FET and pn junction devices. All of these devices are relevant to spin-based devices as well.
Original language | English |
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Pages | 276-286 |
Number of pages | 11 |
State | Published - 2004 |
Event | State-of-the-Art Program on Compound Semiconductors XLI and Nitride and Wide Bandgap Semiconductors for Sensors, Photonics, and Electronics V - Proceedings of the International Symposia - Honolulu, HI, United States Duration: 3 Oct 2004 → 8 Oct 2004 |
Conference
Conference | State-of-the-Art Program on Compound Semiconductors XLI and Nitride and Wide Bandgap Semiconductors for Sensors, Photonics, and Electronics V - Proceedings of the International Symposia |
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Country/Territory | United States |
City | Honolulu, HI |
Period | 3/10/04 → 8/10/04 |