Chemical warfare agent sensor using MEMS structure and thick film fabrication method

Nak Jin Choi, Yun Su Lee, Jun Hyuk Kwak, Joon Shik Park, Kwang Bum Park, Kyu Sik Shin, Hyo Derk Park, Jae Chang Kim, Jeung Soo Huh, Duk Dong Lee

Research output: Contribution to journalArticlepeer-review

30 Scopus citations

Abstract

Recently, many researchers have been attempted to reduce the power consumption in the sensor system and to increase the sensitivity for toxic gases. Most metal oxide sensing films are deposited on an alumina substrate which is easy process but needs high power consumption. Moreover, thin film sensor deposited on the Si substrate shows low sensitivity. Accordingly, this study investigated the fabrication of thick film gas sensors based on tin oxide on a Si substrate. Two heater shapes using a micro electro mechanical system (MEMS) are designed and simulated, and their gas response characteristics to test gases were examined. The sensing materials are SnO2 mixed with Al2O3, and test gases are CH2Cl2, CH3CN as simulant chemical warfare agents. Consequently, high sensitivity is acquired by using a thick sensing film and low power consumption is achieved by using MEMS technology.

Original languageEnglish
Pages (from-to)177-183
Number of pages7
JournalSensors and Actuators, B: Chemical
Volume108
Issue number1-2 SPEC. ISS.
DOIs
StatePublished - 22 Jul 2005

Keywords

  • Chemical warfare agents
  • MEMS
  • Si process
  • SnO
  • Thick film

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