Communication-corrosion behavior of tungsten metal gate in the presence of hydrogen peroxide at acidic medium

Jihoon Seo; Keungtae You; Jinok Moon; Joo Hyun Kim; Ungyu Paik

doi:10.1149/2.0311704jss

Communication-corrosion behavior of tungsten metal gate in the presence of hydrogen peroxide at acidic medium

Jihoon Seo
, Keungtae You
, Jinok Moon
, Joo Hyun Kim
, Ungyu Paik

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

Herein, the corrosion behaviors of W metal gates in the presence of H₂O₂ at the acidic medium were investigated as a function of dipping time, temperature, and H₂O₂ concentration. We determined the kinetic constants (i.e. k_w and k_h) based on the experimental data. The activation energy (E_a) are calculated from the Arrhenius equation. Thermodynamic parameters (ΔG^‡, ΔH^‡, and ΔS^‡) for the dissolution were determined based on the Eyring plot. These results investigated in this study will provide researchers the prior information on parameters to control the corrosion behaviors of W metal gates during the chemical mechanical planarization (CMP) process.

Original language	English
Pages (from-to)	P169-P171
Journal	ECS Journal of Solid State Science and Technology
Volume	6
Issue number	4
DOIs	https://doi.org/10.1149/2.0311704jss
State	Published - 2017

Access to Document

10.1149/2.0311704jss

Cite this

@article{0e90d59e348c4b3a8dd62b771cae0c68,

title = "Communication-corrosion behavior of tungsten metal gate in the presence of hydrogen peroxide at acidic medium",

abstract = "Herein, the corrosion behaviors of W metal gates in the presence of H2O2 at the acidic medium were investigated as a function of dipping time, temperature, and H2O2 concentration. We determined the kinetic constants (i.e. kw and kh) based on the experimental data. The activation energy (Ea) are calculated from the Arrhenius equation. Thermodynamic parameters (ΔG‡, ΔH‡, and ΔS‡) for the dissolution were determined based on the Eyring plot. These results investigated in this study will provide researchers the prior information on parameters to control the corrosion behaviors of W metal gates during the chemical mechanical planarization (CMP) process.",

author = "Jihoon Seo and Keungtae You and Jinok Moon and Kim, \{Joo Hyun\} and Ungyu Paik",

note = "Publisher Copyright: {\textcopyright} 2017 The Electrochemical Society. [.",

year = "2017",

doi = "10.1149/2.0311704jss",

language = "English",

volume = "6",

pages = "P169--P171",

journal = "ECS Journal of Solid State Science and Technology",

issn = "2162-8769",

publisher = "Electrochemical Society Inc.",

number = "4",

}

TY - JOUR

T1 - Communication-corrosion behavior of tungsten metal gate in the presence of hydrogen peroxide at acidic medium

AU - Seo, Jihoon

AU - You, Keungtae

AU - Moon, Jinok

AU - Kim, Joo Hyun

AU - Paik, Ungyu

PY - 2017

Y1 - 2017

N2 - Herein, the corrosion behaviors of W metal gates in the presence of H2O2 at the acidic medium were investigated as a function of dipping time, temperature, and H2O2 concentration. We determined the kinetic constants (i.e. kw and kh) based on the experimental data. The activation energy (Ea) are calculated from the Arrhenius equation. Thermodynamic parameters (ΔG‡, ΔH‡, and ΔS‡) for the dissolution were determined based on the Eyring plot. These results investigated in this study will provide researchers the prior information on parameters to control the corrosion behaviors of W metal gates during the chemical mechanical planarization (CMP) process.

AB - Herein, the corrosion behaviors of W metal gates in the presence of H2O2 at the acidic medium were investigated as a function of dipping time, temperature, and H2O2 concentration. We determined the kinetic constants (i.e. kw and kh) based on the experimental data. The activation energy (Ea) are calculated from the Arrhenius equation. Thermodynamic parameters (ΔG‡, ΔH‡, and ΔS‡) for the dissolution were determined based on the Eyring plot. These results investigated in this study will provide researchers the prior information on parameters to control the corrosion behaviors of W metal gates during the chemical mechanical planarization (CMP) process.

UR - https://www.scopus.com/pages/publications/85029225619

U2 - 10.1149/2.0311704jss

DO - 10.1149/2.0311704jss

M3 - Article

AN - SCOPUS:85029225619

SN - 2162-8769

VL - 6

SP - P169-P171

JO - ECS Journal of Solid State Science and Technology

JF - ECS Journal of Solid State Science and Technology

IS - 4

ER -

Communication-corrosion behavior of tungsten metal gate in the presence of hydrogen peroxide at acidic medium

Abstract

Access to Document

Other files and links

Fingerprint

Cite this