Abstract
The synthesis of semiconducting TiO2 thin films deposited by reactive sputtering is discussed. In particular, defect doping of the anatase polymorph that is epitaxial stabilized on (0 0 1) LaAlO3 was explored using either oxygen or water vapor as the oxidizing species. For films grown in oxygen, a transition from insulating to metallic conductivity of the films is observed as the O2 pressure is reduced. X-ray diffraction measurements show the presence of the TinO2n-1 phase when the oxygen pressure is reduced sufficiently to induce conductive behavior. Hall measurements indicate that these materials are p-type. In contrast, the use of water vapor as the oxidizing species enabled the formation of n-type semiconducting TiO2 with carrier density on the order of 10 18 cm-3 and mobility of 10-15 cm2/Vs.
| Original language | English |
|---|---|
| Pages (from-to) | 2275-2278 |
| Number of pages | 4 |
| Journal | Solid-State Electronics |
| Volume | 47 |
| Issue number | 12 |
| DOIs | |
| State | Published - Dec 2003 |
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