Continuous fabrication process for double sided micro/nanopatterns

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Abstract

Although roll to roll nanoimprint lithography (R2RNIL) is capable of continuously producing micro/ nanopatterns over a large area at high speed, it is inherently limited by the opacity of the master mould to single sided substrate patterns. This study therefore demonstrates a double sided continuous process, wherein a transparent rigiflex mould is utilised. This is shown to allow continuous imprinting of micro- or nanopatterns over a large area (10 cm wide) by using a remodelled roll to roll imprinting apparatus, and a polyethylene terephthalate (PET) film as a flexible substrate. A maximum production speed of 3 cm s-1 was achieved with a micro prism pattern, in which 150 nm wide nanogratings and 700 nm diameter nanoposts were continuously patterned on a flexible substrate, and also a solid glass substrate. To demonstrate the feasibility of its commercial application, a multifunctional optical film was fabricated with a prism pattern on one side, and a wire grid polarising pattern on the other.

Original languageEnglish
Pages (from-to)S5-21-S5-24
JournalMaterials Research Innovations
Volume18
DOIs
StatePublished - 1 Aug 2014

Keywords

  • Continuous process
  • Double sided patterning
  • Optical film
  • Roll to roll process

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