Continuous patterning of nanogratings by nanochannel-guided lithography on liquid resists

Jong G. Ok; Hui Joon Park; Moon Kyu Kwak; Carlos A. Pina-Hernandez; Se Hyun Ahn; L. Jay Guo

doi:10.1002/adma.201102199

Continuous patterning of nanogratings by nanochannel-guided lithography on liquid resists

Jong G. Ok
, Hui Joon Park
, Moon Kyu Kwak
, Carlos A. Pina-Hernandez
, Se Hyun Ahn
, L. Jay Guo

University of Michigan, Ann Arbor
Molecular Imprints, Inc.

Research output: Contribution to journal › Article › peer-review

26 Scopus citations

Abstract

A nanochannel-guided lithography technique is developed that achieves continuous fabrication of higher aspect-ratio nanograting structures by adopting a cross-linkable liquid resist coating. Under the guidance of nanochannels in the grating mold, the UV-curable liquid resist is smoothly extruded and self-stabilized along the slightly inscribed solid substrate, dictated by the resist wettability to the substrate as well as the substrate topography.

Original language	English
Pages (from-to)	4444-4448
Number of pages	5
Journal	Advanced Materials
Volume	23
Issue number	38
DOIs	https://doi.org/10.1002/adma.201102199
State	Published - 11 Oct 2011

Keywords

UV-curable polymeric materials
capillary lithography
nanoimprinting
nanopatterning
surface modification

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10.1002/adma.201102199

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title = "Continuous patterning of nanogratings by nanochannel-guided lithography on liquid resists",

abstract = "A nanochannel-guided lithography technique is developed that achieves continuous fabrication of higher aspect-ratio nanograting structures by adopting a cross-linkable liquid resist coating. Under the guidance of nanochannels in the grating mold, the UV-curable liquid resist is smoothly extruded and self-stabilized along the slightly inscribed solid substrate, dictated by the resist wettability to the substrate as well as the substrate topography.",

keywords = "UV-curable polymeric materials, capillary lithography, nanoimprinting, nanopatterning, surface modification",

author = "Ok, \{Jong G.\} and Park, \{Hui Joon\} and Kwak, \{Moon Kyu\} and Pina-Hernandez, \{Carlos A.\} and Ahn, \{Se Hyun\} and Guo, \{L. Jay\}",

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doi = "10.1002/adma.201102199",

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AU - Ok, Jong G.

AU - Park, Hui Joon

AU - Kwak, Moon Kyu

AU - Pina-Hernandez, Carlos A.

AU - Ahn, Se Hyun

AU - Guo, L. Jay

PY - 2011/10/11

Y1 - 2011/10/11

N2 - A nanochannel-guided lithography technique is developed that achieves continuous fabrication of higher aspect-ratio nanograting structures by adopting a cross-linkable liquid resist coating. Under the guidance of nanochannels in the grating mold, the UV-curable liquid resist is smoothly extruded and self-stabilized along the slightly inscribed solid substrate, dictated by the resist wettability to the substrate as well as the substrate topography.

AB - A nanochannel-guided lithography technique is developed that achieves continuous fabrication of higher aspect-ratio nanograting structures by adopting a cross-linkable liquid resist coating. Under the guidance of nanochannels in the grating mold, the UV-curable liquid resist is smoothly extruded and self-stabilized along the slightly inscribed solid substrate, dictated by the resist wettability to the substrate as well as the substrate topography.

KW - UV-curable polymeric materials

KW - capillary lithography

KW - nanoimprinting

KW - nanopatterning

KW - surface modification

UR - https://www.scopus.com/pages/publications/80053476530

U2 - 10.1002/adma.201102199

DO - 10.1002/adma.201102199

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JO - Advanced Materials

JF - Advanced Materials

IS - 38

ER -

Continuous patterning of nanogratings by nanochannel-guided lithography on liquid resists

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Keywords

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