Abstract
We report the development of a near-field optical nanolithography method using a roll-type phase-shift mask. Sub-wavelength resolution is achieved using near-field exposure of photoresist through a cylindrical phase mask, allowing dynamic and high throughput continuous patterning. As an application, we present the fabrication of a transparent electrode in the form of a metallic wire grid by using the roller-based optical lithography method. To fabricate a mesh-type metal pattern, a specific phase-shift mask was designed and critical experimental parameters were also studied. As a result, a transparent conductor with suitable properties was achieved with a recently built cylindrical phase-shift lithography prototype designed to pattern on 100mm 2 of substrate area.
Original language | English |
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Article number | 344008 |
Journal | Nanotechnology |
Volume | 23 |
Issue number | 34 |
DOIs | |
State | Published - 31 Aug 2012 |