Continuous photolithography by roll-type mask and applications

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We report the development of an optical micro-/nanolithography method by using a roll-type mask. It includes phase-shift lithography and photolithography for realizing various target dimensions. For sub-wavelength resolution, a structure is achieved using the near-field exposure of a photoresist through a cylindrical phase-mask, allowing highthroughput continuous patterning. By using a film-type metal mask, continuous photolithography was achieved, and this method could be used to control the period of resultant patterns in real time by changing the rotating speed of the cylinder mask. As an application, we present the fabrication of a transparent electrode in the form of a metallic mesh by using the developed roll-type photolithography process. As a result, a transparent conductor with good properties was achieved by using a recently built cylindrical phase-shift lithography prototype, which was designed for patterning on 100-mm2 substrates.

Original languageEnglish
Pages (from-to)1011-1017
Number of pages7
JournalTransactions of the Korean Society of Mechanical Engineers, B
Issue number10
StatePublished - Oct 2012


  • Continuous Process
  • Photolithography
  • Roll to Roll


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