Contracted interlayer distance in graphene/sapphire heterostructure

Shiro Entani, Liubov Yu Antipina, Pavel V. Avramov, Manabu Ohtomo, Yoshihiro Matsumoto, Norie Hirao, Iwao Shimoyama, Hiroshi Naramoto, Yuji Baba, Pavel B. Sorokin, Seiji Sakai

Research output: Contribution to journalArticlepeer-review

29 Scopus citations

Abstract

Direct growth of graphene on insulators is expected to yield significant improvements in performance of graphene-based electronic and spintronic devices. In this study, we successfully reveal the atomic arrangement and electronic properties of a coherent heterostructure of single-layer graphene and α-Al2O3(0001). The analysis of the atomic arrangement of single-layer graphene on α-Al2O3(0001) revealed an apparentcontradiction. The in-plane analysis shows that single-layer graphene grows not in a single-crystalline epitaxial manner, but rather in polycrystalline form, with two strongly pronounced preferred orientations. This suggests relatively weak interfacial interactions are operative. However, we demonstrate that unusually strong physical interactions between graphene and α-Al2O3(0001) exist, as evidenced by the small separation between the graphene and the α-Al2O3(0001) surface. The interfacial interaction is shown to be dominated by the electrostatic forces involved in the graphene π-system and the unsaturated electrons of the topmost O layer of α-Al2O3(0001), rather than the van der Waals interactions. Such features causes graphene hole doping and enable the graphene to slide on the α-Al2O3(0001) surface with only a small energy barrier despite the strong interfacial interactions.

Original languageEnglish
Pages (from-to)1535-1545
Number of pages11
JournalNano Research
Volume8
Issue number5
DOIs
StatePublished - 18 May 2015

Keywords

  • chemical vapor deposition
  • graphene
  • graphene/insulator interface
  • sapphire

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