Controlled airbrush coating of polymer resists in Roll-to-Roll nanoimprinting with regimented residual layer thickness

Sungkwan Koo, Sung Ho Lee, Jeong Dae Kim, Jung Goo Hong, Hyoung Won Baac, Moon Kyu Kwak, Jong G. Ok

Research output: Contribution to journalArticlepeer-review

20 Scopus citations

Abstract

We study the effective resist dispensing in continuous Roll-to-Roll (R2R) nanoimprinting system by using a simple and controlled airbrush coating method. Compared to common spin-coating or drop-casting, airbrushing can better afford the continuous coating operation required in a R2R nanoimprinting system with controlled thickness and uniformity. We use a UV-curable epoxysilsesquioxane (SSQ) and propylene glycol methyl ether acetate (PGMEA) as a concentration control agent, which are airbrushed for a controlled time over a continuously fed flexible or rigid substrate in a R2R conveyer. The R2R nanoimprinting is successfully conducted with uniform pattern quality. By modulating the airbrushing time and resist concentration, the residual layer thickness (RLT) of R2R-imprinted patterns can be readily controlled for specific uses.

Original languageEnglish
Pages (from-to)943-947
Number of pages5
JournalInternational Journal of Precision Engineering and Manufacturing
Volume17
Issue number7
DOIs
StatePublished - 1 Jul 2016

Keywords

  • Airbrush coating
  • Continuous nanopatterning
  • Nanoimprinting
  • Residual layer thickness
  • Roll-to-roll

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