Abstract
We study the effective resist dispensing in continuous Roll-to-Roll (R2R) nanoimprinting system by using a simple and controlled airbrush coating method. Compared to common spin-coating or drop-casting, airbrushing can better afford the continuous coating operation required in a R2R nanoimprinting system with controlled thickness and uniformity. We use a UV-curable epoxysilsesquioxane (SSQ) and propylene glycol methyl ether acetate (PGMEA) as a concentration control agent, which are airbrushed for a controlled time over a continuously fed flexible or rigid substrate in a R2R conveyer. The R2R nanoimprinting is successfully conducted with uniform pattern quality. By modulating the airbrushing time and resist concentration, the residual layer thickness (RLT) of R2R-imprinted patterns can be readily controlled for specific uses.
Original language | English |
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Pages (from-to) | 943-947 |
Number of pages | 5 |
Journal | International Journal of Precision Engineering and Manufacturing |
Volume | 17 |
Issue number | 7 |
DOIs | |
State | Published - 1 Jul 2016 |
Keywords
- Airbrush coating
- Continuous nanopatterning
- Nanoimprinting
- Residual layer thickness
- Roll-to-roll