CW operation and threshold characteristics of all-monolithic InAlGaAs 1.55-μm VCSELs grown by MOCVD

J. H. Shin, B. S. Yoo, W. S. Han, O. K. Kwon, Y. G. Ju, J. H. Lee

Research output: Contribution to journalArticlepeer-review

49 Scopus citations

Abstract

We demonstrate an all-monolithic metal-organic chemical vapor epitaxy (MOCVD)-grown 1.55-μm vertical-cavity surface-emitting laser operating continuous wave up to 35 °C. All the structure is based on the InAlGaAs-InP material system grown by a single step of MOCVD. Wet oxidation of a strained In0.4Al0.6As layer is used for the current confinement. The threshold current, threshold voltage and the external quantum efficiency at room temperature are about 1.6 mA, 2.3 V, and 5.4%, respectively.

Original languageEnglish
Pages (from-to)1031-1033
Number of pages3
JournalIEEE Photonics Technology Letters
Volume14
Issue number8
DOIs
StatePublished - Aug 2002

Keywords

  • Aluminum compounds
  • CVD
  • CW lasers
  • Epitaxial growth
  • Indium compounds
  • Optical fiber communication
  • Semiconductor lasers
  • Surface-emitting laser

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