Abstract
We demonstrate an all-monolithic metal-organic chemical vapor epitaxy (MOCVD)-grown 1.55-μm vertical-cavity surface-emitting laser operating continuous wave up to 35 °C. All the structure is based on the InAlGaAs-InP material system grown by a single step of MOCVD. Wet oxidation of a strained In0.4Al0.6As layer is used for the current confinement. The threshold current, threshold voltage and the external quantum efficiency at room temperature are about 1.6 mA, 2.3 V, and 5.4%, respectively.
Original language | English |
---|---|
Pages (from-to) | 1031-1033 |
Number of pages | 3 |
Journal | IEEE Photonics Technology Letters |
Volume | 14 |
Issue number | 8 |
DOIs | |
State | Published - Aug 2002 |
Keywords
- Aluminum compounds
- CVD
- CW lasers
- Epitaxial growth
- Indium compounds
- Optical fiber communication
- Semiconductor lasers
- Surface-emitting laser