Deep etch-induced damage during ion-assisted chemical etching of sputtered indium-zinc-oxide films in Ar/CH4/H2 plasmas
- L. Stafford
- , W. T. Lim
- , S. J. Pearton
- , Ju Il Song
- , Jae Soung Park
- , Young Woo Heo
- , Joon Hyung Lee
- , Jeong Joo Kim
- , M. Chicoine
- , F. Schiettekatte
- University of Florida
- Kyungpook National University
- University of Montreal
Research output: Contribution to journal › Article › peer-review
3
Scopus
citations