Deep etch-induced damage during ion-assisted chemical etching of sputtered indium-zinc-oxide films in Ar/CH4/H2 plasmas

  • L. Stafford
  • , W. T. Lim
  • , S. J. Pearton
  • , Ju Il Song
  • , Jae Soung Park
  • , Young Woo Heo
  • , Joon Hyung Lee
  • , Jeong Joo Kim
  • , M. Chicoine
  • , F. Schiettekatte

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

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