Deep etch-induced damage during ion-assisted chemical etching of sputtered indium-zinc-oxide films in Ar/CH4/H2 plasmas

L. Stafford, W. T. Lim, S. J. Pearton, Ju Il Song, Jae Soung Park, Young Woo Heo, Joon Hyung Lee, Jeong Joo Kim, M. Chicoine, F. Schiettekatte

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

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