Abstract
This paper presents the design and analysis of gate-recessed AlGaN/GaN Fin-type Field-Effect Transistor (FinFET). The three-dimensional (3-D) technology computer-aided design (TCAD) simulations were performed to analyze the direct-current (DC) and radio-frequency (RF) characteristics for AlGaN/GaN FinFETs. The fin width (Wfin) and the height of GaN layer (HGaN) are the design parameters used to improve the electrical performances of gate-recessed AlGaN/ GaN FinFET.
| Original language | English |
|---|---|
| Pages (from-to) | 554-562 |
| Number of pages | 9 |
| Journal | Journal of Semiconductor Technology and Science |
| Volume | 15 |
| Issue number | 5 |
| DOIs | |
| State | Published - Oct 2015 |
Keywords
- 3-D TCAD
- AlGaN/GaN
- Fin-type field-effect transistor (FinFET)
- Recessed gate
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