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Design and analysis of gate-recessed AlGaN/GaN fin-type field-effect transistor

  • Young In Jang
  • , Jae Hwa Seo
  • , Young Jun Yoon
  • , Hye Rim Eun
  • , Ra Hee Kwon
  • , Jung Hee Lee
  • , Hyuck In Kwon
  • , In Man Kang
  • Kyungpook National University
  • Chung-Ang University

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

This paper presents the design and analysis of gate-recessed AlGaN/GaN Fin-type Field-Effect Transistor (FinFET). The three-dimensional (3-D) technology computer-aided design (TCAD) simulations were performed to analyze the direct-current (DC) and radio-frequency (RF) characteristics for AlGaN/GaN FinFETs. The fin width (Wfin) and the height of GaN layer (HGaN) are the design parameters used to improve the electrical performances of gate-recessed AlGaN/ GaN FinFET.

Original languageEnglish
Pages (from-to)554-562
Number of pages9
JournalJournal of Semiconductor Technology and Science
Volume15
Issue number5
DOIs
StatePublished - Oct 2015

Keywords

  • 3-D TCAD
  • AlGaN/GaN
  • Fin-type field-effect transistor (FinFET)
  • Recessed gate

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