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Design of a Vertical Cylinder GaN Junctionless FET based on its GaN-on-GaN Substrate and Electrical Performance

  • So Ra Jeon
  • , Sang Ho Lee
  • , Jin Park
  • , Ga Eon Kang
  • , Jun Hyeok Heo
  • , Min Seok Kim
  • , Seung Ji Bae
  • , Jeong Woo Hong
  • , In Man Kang
  • Kyungpook National University

Research output: Contribution to journalArticlepeer-review

Abstract

This study presents a comparative analysis of the vertical cylinder and fin-type junctionless field-effect transistors (JLFETs) based on GaN-on-GaN substrates using three-dimensional technical computer-aided design (3D TCAD) simulations. The on-current (Ion) values of the vertical cylinder and fin-type JLFETs are 6.45 and 5.63 kA/cm2, respectively. The corresponding off-current (Ioff) of the devices is calculated as 2.51 × 10−10 and 9.72 × 10−2 A/cm2, respectively. Furthermore, their corresponding Ion/Ioff ratios are 2.57 × 1013 and 5.79 × 104, respectively. Additionally, the Ioff ratio of the devices is 2.58 × 109, and the subthreshold swing (SS) is calculated as 101 and 346 mV/dec, respectively. The static resistance (Ron) and breakdown voltage (BV) represent the figure of merits of the power transistor. Herein, Ron of the vertical cylinder-type device is 0.11 µΩ·cm2, which is lower than 0.62 µΩ·cm2 of the vertical fin-type device, whereas their corresponding BVs are calculated as 2,400 and 2,037 V, respectively. These results show that the BV of the vertical cylinder-type device is ~17.8% higher than that of the vertical fin-type device. Therefore, the vertical cylinder-type GaN JLFET has a higher performance than the vertical fin-type GaN JLFET. Herein, we provide guidance in the designing of high-performance vertical GaN power transistors.

Original languageEnglish
Pages (from-to)359-366
Number of pages8
JournalJournal of Semiconductor Technology and Science
Volume23
Issue number6
DOIs
StatePublished - Dec 2023

Keywords

  • Gallium nitride (GaN)
  • GaN-on-GaN substrate
  • JLFET
  • vertical power transistor

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