Design optimization InGaAs/GaAsSb-based heterojunction Gate-all-around (GAA) arch-shaped tunneling field-effect transistor (A-TFET)

Jae Hwa Seo, Young Jun Yoon, Hwan Gi Lee, In Man Kang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

The InGaAs/GaAsSb-based heterojunction gate-all-around (GAA) arch-shaped tunneling field-effect transistor (A-TFET) has been designed and optimized by Silvaco ATLAS technology computer-aided design (TCAD) simulators. The proposed device has a GaAs0.35Sb0.65-based p-doped source, In0.7Ga0.3As-based i-doped channel and In0.7Ga0.3As-based n-doped drain. The gate-to-drain length (LGD), height of source region (Hsource) and epitaxially grown thickness of channel (tepi) was selected as design optimization variables of InGaAs/GaAsSb-based GAA A-TFET.

Original languageEnglish
Title of host publicationInternational Conference on Electronics, Information and Communication, ICEIC 2018
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1-2
Number of pages2
ISBN (Electronic)9781538647547
DOIs
StatePublished - 2 Apr 2018
Event17th International Conference on Electronics, Information and Communication, ICEIC 2018 - Honolulu, United States
Duration: 24 Jan 201827 Jan 2018

Publication series

NameInternational Conference on Electronics, Information and Communication, ICEIC 2018
Volume2018-January

Conference

Conference17th International Conference on Electronics, Information and Communication, ICEIC 2018
Country/TerritoryUnited States
CityHonolulu
Period24/01/1827/01/18

Keywords

  • Arch-shaped
  • Gate-all-around (GAA)
  • InGaAs/GaAsSb-based
  • TFET

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