Development of a planar 3-DOF nano-positioning stage for compensation of the geometric error in a linear axis

Jae Chang Lee, Min Jae Lee, Seung Han Yang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This paper presents a three degrees of freedom (3-DOF) nano-positioning stage in the plane. In order to apply machining, the stage composes of a parallel kinematic mechanism (PKM) structure with the flexure hinges driven by three piezo-electric actuators to achieve the translations in the X- and Y-axes and rotation in the Z-axis. The design of the stage aims at structural stiffness improvement and miniaturization of the size. The static and dynamic stiffness analysis results are presented to verify the validity of three-DOF motion. The proposed nano-positioning stage has a translational motion of 20 nm and rotational motion of 0.2 arcsec in X-, Y-, and θ-directional motion. Experimental testing has been evaluated to the compensation performance of the developed stage respecting the error of a linear axis. The linear displacement error, horizontal straightness error and yaw error is reduced by 90.8%, 96.5% and 90% respectively.

Original languageEnglish
Title of host publication2016 13th International Conference on Ubiquitous Robots and Ambient Intelligence, URAI 2016
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages331-335
Number of pages5
ISBN (Electronic)9781509008216
DOIs
StatePublished - 21 Oct 2016
Event13th International Conference on Ubiquitous Robots and Ambient Intelligence, URAI 2016 - Xian, China
Duration: 19 Aug 201622 Aug 2016

Publication series

Name2016 13th International Conference on Ubiquitous Robots and Ambient Intelligence, URAI 2016

Conference

Conference13th International Conference on Ubiquitous Robots and Ambient Intelligence, URAI 2016
Country/TerritoryChina
CityXian
Period19/08/1622/08/16

Keywords

  • Flexure hinge
  • Nano-positioning stage
  • Parallel mechanism
  • Piezo-electric actuator

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