TY - JOUR
T1 - Development of ZnO thin films for SAW devices by the ultrasonic spray pyrolysis technique
AU - Kim, Hagbong
AU - Lee, Youngjin
AU - Roh, Yongrae
AU - Jung, Jinyoung
AU - Lee, Manhyeong
AU - Kwon, Hyukchae
PY - 1998
Y1 - 1998
N2 - ZnO thin films for use in SAW filters have been prepared on SiO2/Si substrates by the ultrasonic spray pyrolysis technique. Thickness of the films has been determined through a SAW propagation simulation on the substrate as 8000 angstroms for the ZnO and 5000 angstroms for the SiO2 at which the coupling factor and the Rayleigh wave velocity are 0.9% and 2900 m/sec, respectively. For use in SAW filters, the ZnO thin film should have high resistivity and strong piezoelectric activity, i.e., good c-axis orientation. For simultaneous achievement of the two desired properties, we have rigorously investigated the effects of various deposition parameters through experiments. The optimal deposition conditions have been determined as the substrate temperature of 430 °C, the zinc acetate solution of 0.05 M doped with 20 atomic percent of LiCl, the flow rate of 2.5 ml/min., reactor pressure of 3 Torr, and annealing and cooling down in oxygen environment. Deposited ZnO thin films show good thickness uniformity over a 4 inches wafer, have c-axis orientation ratio over 99%, and have resistivity in the order of 109 ohm·m.
AB - ZnO thin films for use in SAW filters have been prepared on SiO2/Si substrates by the ultrasonic spray pyrolysis technique. Thickness of the films has been determined through a SAW propagation simulation on the substrate as 8000 angstroms for the ZnO and 5000 angstroms for the SiO2 at which the coupling factor and the Rayleigh wave velocity are 0.9% and 2900 m/sec, respectively. For use in SAW filters, the ZnO thin film should have high resistivity and strong piezoelectric activity, i.e., good c-axis orientation. For simultaneous achievement of the two desired properties, we have rigorously investigated the effects of various deposition parameters through experiments. The optimal deposition conditions have been determined as the substrate temperature of 430 °C, the zinc acetate solution of 0.05 M doped with 20 atomic percent of LiCl, the flow rate of 2.5 ml/min., reactor pressure of 3 Torr, and annealing and cooling down in oxygen environment. Deposited ZnO thin films show good thickness uniformity over a 4 inches wafer, have c-axis orientation ratio over 99%, and have resistivity in the order of 109 ohm·m.
UR - http://www.scopus.com/inward/record.url?scp=0032271748&partnerID=8YFLogxK
M3 - Conference article
AN - SCOPUS:0032271748
SN - 1051-0117
VL - 1
SP - 323
EP - 326
JO - Proceedings of the IEEE Ultrasonics Symposium
JF - Proceedings of the IEEE Ultrasonics Symposium
T2 - Proceedings of the 1998 International Ultrasonics Symposium
Y2 - 5 October 1998 through 8 October 1998
ER -