Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Zhiwei Sun; Zhenbin Chen; Wenxu Zhang; Jaewon Choi; Caili Huang; Gajin Jeong; E. Bryan Coughlin; Yautzong Hsu; Xiaomin Yang; Kim Y. Lee; David S. Kuo; Shuaigang Xiao; Thomas P. Russell

doi:10.1002/adma.201501585

Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Zhiwei Sun, Zhenbin Chen, Wenxu Zhang, Jaewon Choi, Caili Huang, Gajin Jeong, E. Bryan Coughlin, Yautzong Hsu, Xiaomin Yang, Kim Y. Lee, David S. Kuo, Shuaigang Xiao, Thomas P. Russell

Research output: Contribution to journal › Article › peer-review

56 Scopus citations

Abstract

Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching.

Original language	English
Pages (from-to)	4364-4370
Number of pages	7
Journal	Advanced Materials
Volume	27
Issue number	29
DOIs	https://doi.org/10.1002/adma.201501585
State	Published - 1 Aug 2015

Keywords

directed self-assembly
lamellar block copolymers
nanoimprint photoresist templates
salt complexes
solvent vapor annealing

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10.1002/adma.201501585

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Sun, Z., Chen, Z., Zhang, W., Choi, J., Huang, C., Jeong, G., Coughlin, E. B., Hsu, Y., Yang, X., Lee, K. Y., Kuo, D. S., Xiao, S., & Russell, T. P. (2015). Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template. Advanced Materials, 27(29), 4364-4370. https://doi.org/10.1002/adma.201501585

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title = "Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template",

abstract = "Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching.",

keywords = "directed self-assembly, lamellar block copolymers, nanoimprint photoresist templates, salt complexes, solvent vapor annealing",

author = "Zhiwei Sun and Zhenbin Chen and Wenxu Zhang and Jaewon Choi and Caili Huang and Gajin Jeong and Coughlin, {E. Bryan} and Yautzong Hsu and Xiaomin Yang and Lee, {Kim Y.} and Kuo, {David S.} and Shuaigang Xiao and Russell, {Thomas P.}",

note = "Publisher Copyright: {\textcopyright} 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.",

year = "2015",

month = aug,

day = "1",

doi = "10.1002/adma.201501585",

language = "English",

volume = "27",

pages = "4364--4370",

journal = "Advanced Materials",

issn = "0935-9648",

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Sun, Z, Chen, Z, Zhang, W, Choi, J, Huang, C, Jeong, G, Coughlin, EB, Hsu, Y, Yang, X, Lee, KY, Kuo, DS, Xiao, S & Russell, TP 2015, 'Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template', Advanced Materials, vol. 27, no. 29, pp. 4364-4370. https://doi.org/10.1002/adma.201501585

Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template. / Sun, Zhiwei; Chen, Zhenbin; Zhang, Wenxu et al.
In: Advanced Materials, Vol. 27, No. 29, 01.08.2015, p. 4364-4370.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

AU - Sun, Zhiwei

AU - Chen, Zhenbin

AU - Zhang, Wenxu

AU - Choi, Jaewon

AU - Huang, Caili

AU - Jeong, Gajin

AU - Coughlin, E. Bryan

AU - Hsu, Yautzong

AU - Yang, Xiaomin

AU - Lee, Kim Y.

AU - Kuo, David S.

AU - Xiao, Shuaigang

AU - Russell, Thomas P.

PY - 2015/8/1

Y1 - 2015/8/1

N2 - Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching.

AB - Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching.

KW - directed self-assembly

KW - lamellar block copolymers

KW - nanoimprint photoresist templates

KW - salt complexes

KW - solvent vapor annealing

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U2 - 10.1002/adma.201501585

DO - 10.1002/adma.201501585

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VL - 27

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JO - Advanced Materials

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ER -

Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

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