Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Zhiwei Sun; Zhenbin Chen; Wenxu Zhang; Jaewon Choi; Caili Huang; Gajin Jeong; E. Bryan Coughlin; Yautzong Hsu; Xiaomin Yang; Kim Y. Lee; David S. Kuo; Shuaigang Xiao; Thomas P. Russell

doi:10.1002/adma.201501585

Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Zhiwei Sun
, Zhenbin Chen
, Wenxu Zhang
, Jaewon Choi
, Caili Huang
, Gajin Jeong
, E. Bryan Coughlin
, Yautzong Hsu
, Xiaomin Yang
, Kim Y. Lee
, David S. Kuo
, Shuaigang Xiao
, Thomas P. Russell

University of Massachusetts
Lanzhou University of Technology
Seagate Technology

Research output: Contribution to journal › Article › peer-review

59 Scopus citations

Abstract

Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching.

Original language	English
Pages (from-to)	4364-4370
Number of pages	7
Journal	Advanced Materials
Volume	27
Issue number	29
DOIs	https://doi.org/10.1002/adma.201501585
State	Published - 1 Aug 2015

Keywords

directed self-assembly
lamellar block copolymers
nanoimprint photoresist templates
salt complexes
solvent vapor annealing

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10.1002/adma.201501585

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Sun, Z., Chen, Z., Zhang, W., Choi, J., Huang, C., Jeong, G., Coughlin, E. B., Hsu, Y., Yang, X., Lee, K. Y., Kuo, D. S., Xiao, S., & Russell, T. P. (2015). Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template. Advanced Materials, 27(29), 4364-4370. https://doi.org/10.1002/adma.201501585

@article{b56710e733114b5dac744d63901d1365,

title = "Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template",

abstract = "Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching.",

keywords = "directed self-assembly, lamellar block copolymers, nanoimprint photoresist templates, salt complexes, solvent vapor annealing",

author = "Zhiwei Sun and Zhenbin Chen and Wenxu Zhang and Jaewon Choi and Caili Huang and Gajin Jeong and Coughlin, \{E. Bryan\} and Yautzong Hsu and Xiaomin Yang and Lee, \{Kim Y.\} and Kuo, \{David S.\} and Shuaigang Xiao and Russell, \{Thomas P.\}",

note = "Publisher Copyright: {\textcopyright} 2015 WILEY-VCH Verlag GmbH \& Co. KGaA, Weinheim.",

year = "2015",

month = aug,

day = "1",

doi = "10.1002/adma.201501585",

language = "English",

volume = "27",

pages = "4364--4370",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "29",

}

Sun, Z, Chen, Z, Zhang, W, Choi, J, Huang, C, Jeong, G, Coughlin, EB, Hsu, Y, Yang, X, Lee, KY, Kuo, DS, Xiao, S & Russell, TP 2015, 'Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template', Advanced Materials, vol. 27, no. 29, pp. 4364-4370. https://doi.org/10.1002/adma.201501585

Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template. / Sun, Zhiwei; Chen, Zhenbin; Zhang, Wenxu et al.
In: Advanced Materials, Vol. 27, No. 29, 01.08.2015, p. 4364-4370.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

AU - Sun, Zhiwei

AU - Chen, Zhenbin

AU - Zhang, Wenxu

AU - Choi, Jaewon

AU - Huang, Caili

AU - Jeong, Gajin

AU - Coughlin, E. Bryan

AU - Hsu, Yautzong

AU - Yang, Xiaomin

AU - Lee, Kim Y.

AU - Kuo, David S.

AU - Xiao, Shuaigang

AU - Russell, Thomas P.

PY - 2015/8/1

Y1 - 2015/8/1

N2 - Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching.

AB - Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching.

KW - directed self-assembly

KW - lamellar block copolymers

KW - nanoimprint photoresist templates

KW - salt complexes

KW - solvent vapor annealing

UR - https://www.scopus.com/pages/publications/84938417614

U2 - 10.1002/adma.201501585

DO - 10.1002/adma.201501585

M3 - Article

AN - SCOPUS:84938417614

SN - 0935-9648

VL - 27

SP - 4364

EP - 4370

JO - Advanced Materials

JF - Advanced Materials

IS - 29

ER -

Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

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