Effect of Al doping in GaN films grown by metalorganic chemical vapor deposition

Jae Hoon Lee, Sung Ho Hahm, Jung Hee Lee, Sung Bum Bae, Kyu Seok Lee, Yong Hoon Cho, Jong Lam Lee

Research output: Contribution to journalArticlepeer-review

22 Scopus citations

Abstract

The effect of Al doping in GaN films grown by metalorganic chemical vapor deposition was studied using photoluminescence (PL), time-resolved PL, Hall measurements, and reciprocal maps. An increase in the decay lifetime of the GaN band edge emission was observed with the Al-doped GaN. The incorporation of only a small amount of Al in GaN significantly reduces the point-defect-related electron scattering centre.

Original languageEnglish
Pages (from-to)917-919
Number of pages3
JournalApplied Physics Letters
Volume83
Issue number5
DOIs
StatePublished - 4 Aug 2003

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