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Effect of Al doping in GaN films grown by metalorganic chemical vapor deposition

  • Jae Hoon Lee
  • , Sung Ho Hahm
  • , Jung Hee Lee
  • , Sung Bum Bae
  • , Kyu Seok Lee
  • , Yong Hoon Cho
  • , Jong Lam Lee
  • Kyungpook National University
  • Electronics and Telecommunications Research Institute
  • Chungbuk National University
  • Pohang University of Science and Technology

Research output: Contribution to journalArticlepeer-review

23 Scopus citations

Abstract

The effect of Al doping in GaN films grown by metalorganic chemical vapor deposition was studied using photoluminescence (PL), time-resolved PL, Hall measurements, and reciprocal maps. An increase in the decay lifetime of the GaN band edge emission was observed with the Al-doped GaN. The incorporation of only a small amount of Al in GaN significantly reduces the point-defect-related electron scattering centre.

Original languageEnglish
Pages (from-to)917-919
Number of pages3
JournalApplied Physics Letters
Volume83
Issue number5
DOIs
StatePublished - 4 Aug 2003

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