Abstract
The effect of Al doping in GaN films grown by metalorganic chemical vapor deposition was studied using photoluminescence (PL), time-resolved PL, Hall measurements, and reciprocal maps. An increase in the decay lifetime of the GaN band edge emission was observed with the Al-doped GaN. The incorporation of only a small amount of Al in GaN significantly reduces the point-defect-related electron scattering centre.
| Original language | English |
|---|---|
| Pages (from-to) | 917-919 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 83 |
| Issue number | 5 |
| DOIs | |
| State | Published - 4 Aug 2003 |
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