Effect of photosensitivity in acrylic photoreactive electrode pastes on line width uniformity for large-sized plasma display panels

Soon Hak Kim, Younghwan Kwon, Yoon Soo Han, Youngjune Hur, Giseop Kwak, Chang Min Woo, Byung Ki Hur, Lee Soon Park

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

Ag electrodes with line width uniformity for large-sized plasma display panels were successfully fabricated through a photolithographic process using photosensitive Ag pastes with optimized photosensitive properties. The photosensitivity of the Ag electrode pastes in the photolithographic process was investigated as a function of the types and contents of photoinitiators, the molecular weights and acid values of acrylic binders with carboxylic acid groups, and the process variables, such as the UV-light intensity and dose, with a step tablet. This study revealed that the photoinitiator was a major parameter for the photosensitivity of the Ag electrode pastes. With the photosensitivity of the photosensitive Ag electrode pastes optimized by the study of the photoinitiator contents, Ag electrodes with line width uniformity were achieved with an HSP-188 photoinitiator content of 15 wt % on the basis of the reactive monomers, regardless of the variation of the light dose from 250 to 350 mj/cm2 and intensity from 15 to 25 mW/cm2.

Original languageEnglish
Pages (from-to)658-666
Number of pages9
JournalJournal of Applied Polymer Science
Volume107
Issue number1
DOIs
StatePublished - 5 Jan 2008

Keywords

  • Lithography
  • Photopolimerization
  • Processing
  • Radiation

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