Effect of the in situ Cs treatment on field emission of a multi-walled carbon nanotube

Do Hyung Kim; Hyeong Rag Lee; Man Woo Lee; Jin Ho Lee; Yoon Ho Song; Jong Gi Jee; Sang Yun Lee

doi:10.1016/S0009-2614(02)00166-5

Effect of the in situ Cs treatment on field emission of a multi-walled carbon nanotube

Do Hyung Kim, Hyeong Rag Lee, Man Woo Lee, Jin Ho Lee, Yoon Ho Song, Jong Gi Jee, Sang Yun Lee

Department of Physics

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Abstract

The effect of an in situ Cs treatment on the field emission of a multi-walled carbon nanotube (MWNT) was investigated. The field emission of as-grown MWNT shows two Fowler-Nordheim (F-N) slopes in current-voltage characteristics. Both slopes in the two regions (high voltage and low voltage) were lowered as the result of the Cs treatment. The turn-on voltage was significantly decreased by a factor of about 1.3 and the total emission current was increased by over one order of magnitude after Cs deposition. In addition, the emission current was decreased beyond the optimum Cs deposition time. A stable emission current was observed after Cs deposition and during the no-Cs-deposition state. A decrease in work function is the major cause of the electron field enhancement as the result of the formation of a surface dipole layer induced by Cs deposition.

Original language	English
Pages (from-to)	53-58
Number of pages	6
Journal	Chemical Physics Letters
Volume	355
Issue number	1-2
DOIs	https://doi.org/10.1016/S0009-2614(02)00166-5
State	Published - 25 Mar 2002

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title = "Effect of the in situ Cs treatment on field emission of a multi-walled carbon nanotube",

abstract = "The effect of an in situ Cs treatment on the field emission of a multi-walled carbon nanotube (MWNT) was investigated. The field emission of as-grown MWNT shows two Fowler-Nordheim (F-N) slopes in current-voltage characteristics. Both slopes in the two regions (high voltage and low voltage) were lowered as the result of the Cs treatment. The turn-on voltage was significantly decreased by a factor of about 1.3 and the total emission current was increased by over one order of magnitude after Cs deposition. In addition, the emission current was decreased beyond the optimum Cs deposition time. A stable emission current was observed after Cs deposition and during the no-Cs-deposition state. A decrease in work function is the major cause of the electron field enhancement as the result of the formation of a surface dipole layer induced by Cs deposition.",

author = "Kim, {Do Hyung} and Lee, {Hyeong Rag} and Lee, {Man Woo} and Lee, {Jin Ho} and Song, {Yoon Ho} and Jee, {Jong Gi} and Lee, {Sang Yun}",

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T1 - Effect of the in situ Cs treatment on field emission of a multi-walled carbon nanotube

AU - Kim, Do Hyung

AU - Lee, Hyeong Rag

AU - Lee, Man Woo

AU - Lee, Jin Ho

AU - Song, Yoon Ho

AU - Jee, Jong Gi

AU - Lee, Sang Yun

PY - 2002/3/25

Y1 - 2002/3/25

N2 - The effect of an in situ Cs treatment on the field emission of a multi-walled carbon nanotube (MWNT) was investigated. The field emission of as-grown MWNT shows two Fowler-Nordheim (F-N) slopes in current-voltage characteristics. Both slopes in the two regions (high voltage and low voltage) were lowered as the result of the Cs treatment. The turn-on voltage was significantly decreased by a factor of about 1.3 and the total emission current was increased by over one order of magnitude after Cs deposition. In addition, the emission current was decreased beyond the optimum Cs deposition time. A stable emission current was observed after Cs deposition and during the no-Cs-deposition state. A decrease in work function is the major cause of the electron field enhancement as the result of the formation of a surface dipole layer induced by Cs deposition.

AB - The effect of an in situ Cs treatment on the field emission of a multi-walled carbon nanotube (MWNT) was investigated. The field emission of as-grown MWNT shows two Fowler-Nordheim (F-N) slopes in current-voltage characteristics. Both slopes in the two regions (high voltage and low voltage) were lowered as the result of the Cs treatment. The turn-on voltage was significantly decreased by a factor of about 1.3 and the total emission current was increased by over one order of magnitude after Cs deposition. In addition, the emission current was decreased beyond the optimum Cs deposition time. A stable emission current was observed after Cs deposition and during the no-Cs-deposition state. A decrease in work function is the major cause of the electron field enhancement as the result of the formation of a surface dipole layer induced by Cs deposition.

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DO - 10.1016/S0009-2614(02)00166-5

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SN - 0009-2614

VL - 355

SP - 53

EP - 58

JO - Chemical Physics Letters

JF - Chemical Physics Letters

IS - 1-2

ER -

Effect of the in situ Cs treatment on field emission of a multi-walled carbon nanotube

Abstract

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