Effects of high-dose Mn implantation into ZnO grown on sapphire

Y. W. Heo, M. P. Ivill, K. Ip, D. P. Norton, S. J. Pearton, J. G. Kelly, R. Rairigh, A. F. Hebard, T. Steiner

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175 Scopus citations

Abstract

The effects of high-dose manganese (Mn) implantation into ZnO thin films grown on sapphire substrates which produces ferromagnetism for n-type doping levels were discussed. The ZnO films were grown by pulse-laser deposition on c-plane Al 2O 3 substrates. It was observed that films showed n-type carrier concentration in the range of 2-5 × 10 20 cm -3 and room temperature hysteresis in magnetization loops, after Mn implantation and subsequent annealing at 600°C. The coercivity and saturation magnetization were strong functions of the annealing temperature and thus carrier concentrations, crystalline quality and residual defects account for the magnetic properties of ZnO:Mn.

Original languageEnglish
Pages (from-to)2292-2294
Number of pages3
JournalApplied Physics Letters
Volume84
Issue number13
DOIs
StatePublished - 29 Mar 2004

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