Effects of process parameters on low-temperature silicon homoepitaxy by ultrahigh-vacuum electron-cyclotron-resonance chemical-vapor deposition
- Heung Sik Tae
- , Seok Hee Hwang
- , Sang June Park
- , Euijoon Yoon
- , Ki Woong Whang
- Seoul National University
Research output: Contribution to journal › Article › peer-review
16
Scopus
citations