Abstract
We proposed and investigated the characteristics of a lateral field emission array (LFEA) structure with polycrystalline silicon emitters using the LOCOS (local oxidation of polysilicon) process for display applications. We fabricated an LFEA device which had a 600×600 μm2 pixel with 28 cathode tips and 56 gate tips. It showed a very low turn-on voltage of about 8 V and a quite high emission current of 424 μA/pixel at a substrate-to-cathode voltage of 40 V and VGC=0 V. If phosphor arrayed anode ITO glass is aligned with the LFEA, which is selectively etched through for an electron path, the LEFA will be highly applicable as a field emission display with many advantages, such as simple process, easy distance control between the anode and the cathode, and low process cost.
Original language | English |
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Pages (from-to) | 850-853 |
Number of pages | 4 |
Journal | Journal of the Korean Physical Society |
Volume | 37 |
Issue number | 6 |
DOIs | |
State | Published - Dec 2000 |