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Electrical characterization of GaN-channel MOSFETs

  • Jakub Jasinski
  • , Lidia Lukasiak
  • , Andrzej Jakubowski
  • , Do Kywn Kim
  • , Dong Seok Kim
  • , Sung Ho Hahm
  • , Jung Hee Lee
  • Warsaw University of Technology
  • Kyungpook National University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The channel mobility and reliability of NMOSFETs with GaN channel are investigated by means of split CV and constant-voltage-stress techniques. The influence of stress polarity and duration on current in the off-state, threshold voltage and subthreshold slope is studied.

Original languageEnglish
Title of host publicationElectron Technology Conference 2013
DOIs
StatePublished - 2013
Event11th Conference on Electron Technology, ELTE 2013 - Ryn, Poland
Duration: 16 Apr 201220 Apr 2012

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8902
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

Conference11th Conference on Electron Technology, ELTE 2013
Country/TerritoryPoland
CityRyn
Period16/04/1220/04/12

Keywords

  • GaN-channel MOSFET
  • mobility
  • reliability
  • subthreshold slope
  • threshold voltage

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