@inproceedings{83df2ba289ff492f86142fc58a9210ce,
title = "Electron beam projection nanopatterning using crystal lattice images obtained from high resolution transmission electron microscopy",
abstract = "We have developed a new electron beam projection lithography technique for nanometer-scale patterning utilizing the {\AA}ngstrom-scale lattice images which can be obtained by HRTEM. We successfully fabricated periodic arrays of various patterned structures with feature sizes of about 25 nm using single-crystalline Si and β-Si{\'3}N4 as the mask materials.",
author = "Lee, \{H. S.\} and Kim, \{B. S.\} and Kim, \{H. M.\} and Wi, \{J. S.\} and Nam, \{S. W.\} and Kim, \{K. B.\} and Y. Arai",
year = "2007",
doi = "10.1109/IMNC.2007.4456282",
language = "English",
isbn = "4990247248",
series = "Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC",
pages = "418--419",
booktitle = "Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC",
note = "s20th International Microprocesses and Nanotechnology Conference, MNC 2007 ; Conference date: 05-11-2007 Through 08-11-2007",
}