Enhanced UV-visible rejection ratio in an MSM UV photodetector fabricated on N-face GaN by thermal annealing effects

Chang Ju Lee, Young Jin Kwon, Hyun Gu Cha, Sung Ho Hahm

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

We investigated a thermal annealing effect on N-face GaN with electrical and optical characteristics. We used Al Schottky electrodes for the formation of Al-N bonding. The dark current level increased after an annealing at low temperatures below 673 K while it decreased after annealing at 773 K. It was found that the AlN barrier was formed by thermal annealing at 773 K. In the spectral photo-responsivity characteristics, the maximum responsivity decreased and UV/visible rejection ratio was significantly improved with annealing at 773 K.

Original languageEnglish
Title of host publication2012 IEEE International Conference on Electron Devices and Solid State Circuit, EDSSC 2012
DOIs
StatePublished - 2012
Event2012 8th IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2012 - Bangkok, Thailand
Duration: 3 Dec 20125 Dec 2012

Publication series

Name2012 IEEE International Conference on Electron Devices and Solid State Circuit, EDSSC 2012

Conference

Conference2012 8th IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2012
Country/TerritoryThailand
CityBangkok
Period3/12/125/12/12

Keywords

  • GaN
  • N-face
  • Photodetector
  • Thermal Annealing
  • UV

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