Experimental study on quantum mechanical effect for insensitivity of threshold voltage against temperature variation in strained SOI MOSFETs

Chang Hoon Jeon, Byung Hyun Lee, Byung Chul Jang, Sung Yool Choi, Yang Kyu Choi

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Scopus citations

Abstract

The temperature dependence of threshold voltage (VT) in a thin-body MOSFET, which was built on a strained silicon-on-insulator (sSOI) wafer, is examined in a temperature range of 173 K to 373 K. The insensitive temperature dependency of threshold voltage (VT) is attributed to the strain effect arisen from the sSOI, which makes the energy quantization stronger due to the lowered conductivity mass. Additionally, enhanced mobility of 770 cm2/V·sec at room temperature is achieved due to the strain effect.

Original languageEnglish
Title of host publication2015 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2015
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781509002597
DOIs
StatePublished - 20 Nov 2015
EventIEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2015 - Rohnert Park, United States
Duration: 5 Oct 20158 Oct 2015

Publication series

Name2015 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2015

Conference

ConferenceIEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2015
Country/TerritoryUnited States
CityRohnert Park
Period5/10/158/10/15

Keywords

  • quantum mechanical effect
  • silicon on insulator (SOI)
  • strained SOI (sSOI)
  • temperature dependency
  • threshold voltage
  • ultra-thin body (UTB)

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