Extraction and modeling of physics-based gate resistance components in RF MOSFETs

Myounggon Kang, In Man Kang, Hyungcheol Shin

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Scopus citations

Abstract

A simple and accurate method is presented for extraction of the effective gate resistance of RF MOSFETs. Both the gate electrode resistance and the channel resistance were extracted separately. The proposed physics-based gate resistance model can accurately predict not only the bias dependency but also the dependence on the number of fingers, channel lengths, and widths

Original languageEnglish
Title of host publication2006 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems - Digest of Papers
Pages218-221
Number of pages4
DOIs
StatePublished - 2006
Event2006 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems - San Diego, CA, United States
Duration: 18 Jan 200620 Jan 2006

Publication series

Name2006 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems - Digest of Papers
Volume2006

Conference

Conference2006 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems
Country/TerritoryUnited States
CitySan Diego, CA
Period18/01/0620/01/06

Keywords

  • Channel resistance
  • Electrode resistance
  • Gate resistance
  • Modeling
  • Parameter extraction
  • RF MOSFETs

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