TY - JOUR
T1 - Extraction method for substrate-related components of vertical junctionless silicon nanowire field-effect transistors and its verification on radio frequency characteristics
AU - Shin, Sunhae
AU - Kang, In Man
AU - Kim, Kyung Rok
PY - 2012/6
Y1 - 2012/6
N2 - In this paper, we propose a radio-frequency (RF) model and parameter extraction method for vertical junctionless silicon nanowire (VJL SNW) field-effect transistors (FETs) using three-dimensional (3D) device simulation. We introduce the substrate-related components such as the substrate resistance (R sub) and drain-to-substrate capacitance (C sub), and evaluate the RF performance such as f t, f max, gate input capacitance, and transport time delay. A quasi-static (QS) RF model has been used in simulation program with integrated circuit emphasis (SPICE) circuit simulator to simulate VJL SNW FETs with RF parameters extracted from 3D device simulated Y-parameters. We confirmed the validity of our RF model by the well-matched results between HSPICE and 3D device simulation in terms of the Y-parameters and the S 22-parameter up to 100 GHz.
AB - In this paper, we propose a radio-frequency (RF) model and parameter extraction method for vertical junctionless silicon nanowire (VJL SNW) field-effect transistors (FETs) using three-dimensional (3D) device simulation. We introduce the substrate-related components such as the substrate resistance (R sub) and drain-to-substrate capacitance (C sub), and evaluate the RF performance such as f t, f max, gate input capacitance, and transport time delay. A quasi-static (QS) RF model has been used in simulation program with integrated circuit emphasis (SPICE) circuit simulator to simulate VJL SNW FETs with RF parameters extracted from 3D device simulated Y-parameters. We confirmed the validity of our RF model by the well-matched results between HSPICE and 3D device simulation in terms of the Y-parameters and the S 22-parameter up to 100 GHz.
UR - http://www.scopus.com/inward/record.url?scp=84863326479&partnerID=8YFLogxK
U2 - 10.1143/JJAP.51.06FE20
DO - 10.1143/JJAP.51.06FE20
M3 - Article
AN - SCOPUS:84863326479
SN - 0021-4922
VL - 51
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
IS - 6 PART 2
M1 - 06FE20
ER -