Fabrication and performance analysis of an amorphous silicon-based thermal IR detector

Hyun Oh Kang; Zhao Zhiguo; Seong Ki Jeon; Ho Jung; Hak Rin Kim; Dae Hyuk Kwon; Jung Hee Lee; Shin Won Kang; Seong Ho Kong

doi:10.1109/NEMS.2010.5592504

Fabrication and performance analysis of an amorphous silicon-based thermal IR detector

Hyun Oh Kang, Zhao Zhiguo, Seong Ki Jeon, Ho Jung, Hak Rin Kim, Dae Hyuk Kwon, Jung Hee Lee, Shin Won Kang, Seong Ho Kong

School of Electronics Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

3 Scopus citations

Abstract

In this paper, an amorphous Si-based thermal infrared detector with an improved responsivity and optimized structure is reported. Using Finite Element Analysis (FEA) simulation, the length and structure of the leg to extend sensing area are designed to minimize the heat loss of uncooled bolometric amorphous Si-based thermal infrared detector. The thermal infrared detector is fabricated using microelectro mechanical system (MEMS) technology and the operating performances of thermal infrared detector are analyzed and compared with conventional thermal infrared detectors.

Original language	English
Title of host publication	2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
Pages	696-699
Number of pages	4
DOIs	https://doi.org/10.1109/NEMS.2010.5592504
State	Published - 2010
Event	5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010 - Xiamen, China Duration: 20 Jan 2010 → 23 Jan 2010

Publication series

Name	2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010

Conference

Conference	5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
Country/Territory	China
City	Xiamen
Period	20/01/10 → 23/01/10

Keywords

Amorphous silicon
Bolometer
Thermal image sensor
Uncooled infrared detector

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10.1109/NEMS.2010.5592504

Cite this

Kang, H. O., Zhiguo, Z., Jeon, S. K., Jung, H., Kim, H. R., Kwon, D. H., Lee, J. H., Kang, S. W., & Kong, S. H. (2010). Fabrication and performance analysis of an amorphous silicon-based thermal IR detector. In 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010 (pp. 696-699). Article 5592504 (2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010). https://doi.org/10.1109/NEMS.2010.5592504

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title = "Fabrication and performance analysis of an amorphous silicon-based thermal IR detector",

abstract = "In this paper, an amorphous Si-based thermal infrared detector with an improved responsivity and optimized structure is reported. Using Finite Element Analysis (FEA) simulation, the length and structure of the leg to extend sensing area are designed to minimize the heat loss of uncooled bolometric amorphous Si-based thermal infrared detector. The thermal infrared detector is fabricated using microelectro mechanical system (MEMS) technology and the operating performances of thermal infrared detector are analyzed and compared with conventional thermal infrared detectors.",

keywords = "Amorphous silicon, Bolometer, Thermal image sensor, Uncooled infrared detector",

author = "Kang, {Hyun Oh} and Zhao Zhiguo and Jeon, {Seong Ki} and Ho Jung and Kim, {Hak Rin} and Kwon, {Dae Hyuk} and Lee, {Jung Hee} and Kang, {Shin Won} and Kong, {Seong Ho}",

year = "2010",

doi = "10.1109/NEMS.2010.5592504",

language = "English",

isbn = "9781424465439",

series = "2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010",

pages = "696--699",

booktitle = "2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010",

note = "5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010 ; Conference date: 20-01-2010 Through 23-01-2010",

}

Kang, HO, Zhiguo, Z, Jeon, SK, Jung, H, Kim, HR, Kwon, DH, Lee, JH, Kang, SW & Kong, SH 2010, Fabrication and performance analysis of an amorphous silicon-based thermal IR detector. in 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010., 5592504, 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010, pp. 696-699, 5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010, Xiamen, China, 20/01/10. https://doi.org/10.1109/NEMS.2010.5592504

Fabrication and performance analysis of an amorphous silicon-based thermal IR detector. / Kang, Hyun Oh; Zhiguo, Zhao; Jeon, Seong Ki et al.
2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010. 2010. p. 696-699 5592504 (2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Fabrication and performance analysis of an amorphous silicon-based thermal IR detector

AU - Kang, Hyun Oh

AU - Zhiguo, Zhao

AU - Jeon, Seong Ki

AU - Jung, Ho

AU - Kim, Hak Rin

AU - Kwon, Dae Hyuk

AU - Lee, Jung Hee

AU - Kang, Shin Won

AU - Kong, Seong Ho

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N2 - In this paper, an amorphous Si-based thermal infrared detector with an improved responsivity and optimized structure is reported. Using Finite Element Analysis (FEA) simulation, the length and structure of the leg to extend sensing area are designed to minimize the heat loss of uncooled bolometric amorphous Si-based thermal infrared detector. The thermal infrared detector is fabricated using microelectro mechanical system (MEMS) technology and the operating performances of thermal infrared detector are analyzed and compared with conventional thermal infrared detectors.

AB - In this paper, an amorphous Si-based thermal infrared detector with an improved responsivity and optimized structure is reported. Using Finite Element Analysis (FEA) simulation, the length and structure of the leg to extend sensing area are designed to minimize the heat loss of uncooled bolometric amorphous Si-based thermal infrared detector. The thermal infrared detector is fabricated using microelectro mechanical system (MEMS) technology and the operating performances of thermal infrared detector are analyzed and compared with conventional thermal infrared detectors.

KW - Amorphous silicon

KW - Bolometer

KW - Thermal image sensor

KW - Uncooled infrared detector

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DO - 10.1109/NEMS.2010.5592504

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T3 - 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010

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BT - 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010

T2 - 5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010

Y2 - 20 January 2010 through 23 January 2010

ER -

Kang HO, Zhiguo Z, Jeon SK, Jung H, Kim HR, Kwon DH et al. Fabrication and performance analysis of an amorphous silicon-based thermal IR detector. In 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010. 2010. p. 696-699. 5592504. (2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010). doi: 10.1109/NEMS.2010.5592504

Fabrication and performance analysis of an amorphous silicon-based thermal IR detector

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