@inproceedings{735b7691666f497b967eed89fa65157d,
title = "Fabrication of a MEMS-based PCR micro-reactor, using IR heating",
abstract = "Silicon and glass wafers were used as bottom and top of the device, respectively, to fabricate micro-electro-mechanical-systems (MEMS)-based polymerase chain reaction (PCR) micro-reactor by infrared (IR) heating. Successful patterning of the Pt sensor in 190μm-deep well was achieved by applying additional process steps to improve the uniformity of photoresist coating at the sharp convex and concave corners. The sharp corners were rounded off using two-step KOH etching, followed by maskless TMAH etching step. The bulk-silicon parts underneath and around the well were etched away from the back side resulting in a suspended PCR well by the inlet and outlet channels to minimize the thermal mass of the PCR well.",
author = "Im, {Ki Sik} and Kong, {Seong Ho} and Lee, {Jung Hee} and Shin, {Jang Kyoo} and Lee, {Jong Hyun}",
year = "2004",
language = "English",
isbn = "4990247205",
series = "Digest of Papers - Microprocesses and Nanotechnology 2004",
pages = "250--251",
booktitle = "Digest of Papers - Microprocesses and Nanotechnology 2004",
note = "2004 International Microprocesses and Nanotechnology Conference ; Conference date: 26-10-2004 Through 29-10-2004",
}